Dielectric capacitors are critical for energy storage applications, especially in pulsed power systems, owing to their ultrahigh power density and ultrafast charge/discharge capabilities. Among them, HfO₂-based thin films are particularly promising for micro-energy storage devices. In this work, double-layered Hf₀.₅Zr₀.₅O₂(3 nm)/ZrO₂(12 nm) (HZO3ZO12) films are deposited across a wide temperature range (80–225°C) to systematically investigate their energy storage performance. A machine learning-assisted multi-objective optimization app...
