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Simulation Study of A 1200V 4H-SiC Lateral MOSFETs with Double-RESURFs Technology for Reducing Saturation Current

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成果类型:
期刊论文
作者:
Lijuan Wu*;Jiahong He;Zhipeng Shen;Gengbin Zhu;Qiqi Tang;...
通讯作者:
Lijuan Wu
作者机构:
[Lijuan Wu; Jiahong He; Zhipeng Shen; Gengbin Zhu; Qiqi Tang; Zongyang Yi; Guanglin Yang; Deqiang Yang] School of Physics and Electronic Science, Changsha University of Science and Technology, Yuntang Campus, 410114 Changsha, China
通讯机构:
[Lijuan Wu] S
School of Physics and Electronic Science, Changsha University of Science and Technology, Yuntang Campus, 410114 Changsha, China
语种:
英文
期刊:
Micro and Nanostructures
ISSN:
2773-0123
年:
2025
页码:
208218
机构署名:
本校为第一且通讯机构
院系归属:
物理与电子科学学院
摘要:
A 1200V 4H-SiC lateral double-diffused MOSFETs (LDMOS) with embedded auto-adjust JFET (AD-JEFT) and double-reduced surface fields technology is proposed. The AD-JEFT, as the conduction path of electrons from N+ source to the P-well channel, is embedded in P+ well. In the on-state, as the device is pressurized, the increase of depletion charge will reduce the effective channel width of AD-JFET. As a result, the potential barrier of the AD-JFET channel will increase rapidly, making it difficult for electrons to transfer and resulting in a reduction of the saturation current. Compared with the co...

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