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Simulation Study of A 1200V 4H-SiC Lateral MOSFETs with Double-RESURFs Technology for Reducing Saturation Current

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成果类型:
期刊论文
作者:
Wu, Lijuan;He, Jiahong;Shen, Zhipeng;Zhu, Gengbin;Tang, Qiqi;...
通讯作者:
Wu, LJ
作者机构:
[Yi, Zongyang; Wu, LJ; Tang, Qiqi; Yang, Guanglin; Wu, Lijuan; He, Jiahong; Shen, Zhipeng; Zhu, Gengbin; Yang, Deqiang] Changsha Univ Sci & Technol, Sch Phys & Elect Sci, Yuntang Campus, Changsha 410114, Peoples R China.
通讯机构:
[Wu, LJ ] C
Changsha Univ Sci & Technol, Sch Phys & Elect Sci, Yuntang Campus, Changsha 410114, Peoples R China.
语种:
英文
关键词:
Auto-adjust JFET (AD-JEFT);Breakdown voltage ( BV );LDMOS with AD-JEFT (ADJ-LDMOS);Saturation current ( I (dsat) )
期刊:
Micro and Nanostructures
ISSN:
2773-0123
年:
2025
卷:
205
页码:
208218
机构署名:
本校为第一且通讯机构
院系归属:
物理与电子科学学院
摘要:
A 1200V 4H-SiC lateral double-diffused MOSFETs (LDMOS) with embedded auto-adjust JFET (AD-JEFT) and double-reduced surface fields technology is proposed. The AD-JEFT, as the conduction path of electrons from N+ source to the P-well channel, is embedded in P+ well. In the on-state, as the device is pressurized, the increase of depletion charge will reduce the effective channel width of AD-JFET. As a result, the potential barrier of the AD-JFET channel will increase rapidly, making it difficult for electrons to transfer and resulting in a reduction of the saturation current. Compared with the co...

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