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Analytical model for high-k SOI pLDMOS with self-adaptive balance of polarization charge

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成果类型:
期刊论文
作者:
Wu, Lijuan;Qiu, Tao;Song, Xuanting;Zhang, Banghui;Liu, Heng;...
通讯作者:
Lijuan Wu
作者机构:
[Qiu, Tao; Wu, Lijuan; Song, Xuanting; Zhang, Banghui; Liu, Qing; Liu, Heng] Changsha Univ Sci & Technol, Sch Phys & Elect Sci, Hunan Prov Key Lab Flexible Elect Mat Genome Engn, Changsha 410114, Peoples R China.
通讯机构:
[Lijuan Wu] H
Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, The School of Physics & Electronic Science, Changsha University of Science & Technology, Changsha, 410114, China
语种:
英文
关键词:
High-k;Back gate;Breakdownvoltage;Polarization charge;Specific on-resistance;Analytical model
期刊:
Microelectronics Journal
ISSN:
0959-8324
年:
2023
卷:
132
页码:
105677
基金类别:
Hunan Provincial Natural Science Foundation of China [2021JJ30738]; Scientific Research Fund of Hunan Provincial Education Department [19K001]; Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering?s Open Fund Project-2020 [202016]
机构署名:
本校为第一机构
院系归属:
物理与电子科学学院
摘要:
The analytical model of high -k SOI pLDMOS (HK SOI pLDMOS) with adaptive polarization charges is proposed in this paper. The HK SOI pLDMOS structure features a HK dielectric trench, which can introduce polarization charges to keep inner self-charge balance with the ions in the drift region and the carriers in the substrate. The HK trench assists the depletion in drift region to decreased the special on-resistance (RON,sp). In order to further modulate the electric field and reduce the RON,sp, a back gate is planted in the substrate. The analytical model of potential and the surface electric fi...

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