期刊论文

The study of process realization and characteristics for avalanche photodiode with SAM structure

中文

电子技术

1000-0755

2018

47

5

16-18

10.3969/j.issn.1000-0755.2018.05.005

本校为第一机构

利用SILVACO软件的两个组件ATHENA和ATLAS对SAM结构雪崩光电二极管分别进行工艺仿真和特性研究。利用ATHENA模块得到器件的掺杂浓度分布和掺杂区域隔离。利用ATLAS模块对ATHENA得到器件结构进行雪崩击穿电压和有无光照时的电流电压特性进行软件模拟。在合理掺杂浓度时该雪崩光电二极管的击穿电压约为6.2V。

Two components of SILVACO software, ATHENA and ATLAS, were adopted to study the process realization and characteristics of SAM avalanche photodiode. Using ATHENA to realize the doped concentration distribution and doped area isolation. The ATLAS was used to simulate avalanche breakdown voltage and the I-V Characteristics with and without light, respectively, for device which achieved by ATHENA. The breakdown voltage of the avalanche photod...